Nearfield Instruments
51 - 200 employees
Founded 2016
🔧 Hardware
🤝 B2B
🔬 Science
💰 $147.2M Series C - Nearfield Instruments on 2024-07
Hardware • B2B • Science
Nearfield Instruments is a developer of automated, high-throughput atomic force microscopy (AFM) systems for 3D metrology. The company builds hardware and software solutions that deliver atom-scale resolution and industry-level throughput to address process-control challenges in the high-end nano-electronics and semiconductor industries. Its product suite and technologies (e. g. , QUADRA sidewall imaging, Lightning mode, AUDIRA) enable advanced scanning-probe metrology for manufacturers and research organizations worldwide.
Senior Lithography Application Engineer
🕒 February 25
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Nearfield Instruments
51 - 200 employees
Founded 2016
🔧 Hardware
🤝 B2B
🔬 Science
💰 $147.2M Series C - Nearfield Instruments on 2024-07
Hardware • B2B • Science
Nearfield Instruments is a developer of automated, high-throughput atomic force microscopy (AFM) systems for 3D metrology. The company builds hardware and software solutions that deliver atom-scale resolution and industry-level throughput to address process-control challenges in the high-end nano-electronics and semiconductor industries. Its product suite and technologies (e. g. , QUADRA sidewall imaging, Lightning mode, AUDIRA) enable advanced scanning-probe metrology for manufacturers and research organizations worldwide.
📋 Description
• Develop and optimize optical imaging models and techniques for use in advanced metrology and inspection. • Translate scanner performance knowledge (CDU, focus, overlay, aberrations, imaging limits) into innovative process control solutions. • Apply expertise in (High-NA) EUV mask characterization, including 3D feature metrology (absorber CD, sidewall angle, height) and resist behavior under EUV and out-of-band light exposure. • Advance methods such as scatterometry and computational imaging to push the limits of in-line process control. • Collaborate with system architects, AFM/imaging experts, and software engineers to integrate imaging innovations into our commercial systems. • Work with leading global semiconductor fabs to validate and deploy solutions in high-volume manufacturing environments.
🎯 Requirements
• PhD or MSc in Physics, Optical Engineering, Electrical Engineering, or related field. • Deep expertise in optical imaging, EUV lithography, and scanner performance optimization. • Proven experience in EUV mask, scatterometry, and resist characterization. • Ability to bridge lithography knowledge with metrology and process control applications. • 5+ years of industry or advanced academic research experience in semiconductor lithography, optical metrology, or related domains. • Strong analytical and problem-solving skills, with the ability to work across disciplines in a fast-paced R&D environment.
🏖️ Benefits
• Competitive salary • 30 Holidays • Pension plan • Holiday allowance • Innovation with passion • 43+ Nationalities • Growing together • Travel the world
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